Reviews for "Chemical Vapor Deposition"

Review this journal Show journal page
Journal title Average duration Review reports
(1st review rnd.)
(click to go to journal page) 1st rev. rnd Tot. handling Im. rejection Number Quality Overall rating Outcome
Chemical Vapor Deposition 3.6
weeks		 3.9
weeks		 n/a 3 4
(very good)		 4
(very good)		 Accepted
Chemical Vapor Deposition 3.0
weeks		 5.0
weeks		 n/a 2 5
(excellent)		 4
(very good)		 Accepted