Reviews for "Chemical Vapor Deposition"
| Journal title | Average duration | Review reports (1st review rnd.) |
|||||
|---|---|---|---|---|---|---|---|
| (click to go to journal page) | 1st rev. rnd | Tot. handling | Im. rejection | Number | Quality | Overall rating | Outcome |
| Chemical Vapor Deposition | 3.6 weeks |
3.9 weeks |
n/a | 3 | 4 (very good) |
4 (very good) |
Accepted |
| Chemical Vapor Deposition | 3.0 weeks |
5.0 weeks |
n/a | 2 | 5 (excellent) |
4 (very good) |
Accepted |
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